TUBULAR KILN, Series TV/O
A tubular laboratory kiln, consisting of a steel structure, stove-enameled with epoxy paint, which is available both in horizontal and in vertical version.
The thermal insulation consists of ceramic fibre and refractory material.
The firing cycle is controlled by a control unit
model K1PX, with which it is possible to program 4 cycles of 8 steps each..
Moreover this unit can automatically control the introduction of an inert gas or a vacuum, if this is provided.
The kiln can be supplied for standard working temperatures from 1.200°C. to 1.600°C.
- Max. working temperature: from 1200°C to 1350°C.
- The kiln can be equipped with working tubes with a diameter between 35 and 70 mm.
- Length of the heating chamber: from 150 to 450 mm.
- These models are equipped with heating elements that are wrapped around a working tube in order to guarantee a great thermal uniformity and that reach high temperatures very fast.
- The control of the atmosphere is possible thanks to the installation of supplementary working tubes and accessories (special flanges and discs).
- Max. working temperature: 1600°C.
- The kiln can be equipped with working temperatures with a diameter up to 70 mm.
- Length of the heating chamber: from 160 to 450 mm.
- These models are equipped with heating elements in silicon carbide. The use of heating elements in silicon carbide guarantees a fast temperature increase.
- The system can be adapted for working in a controlled atmosphere or under vacuum, thanks to the use of working tubes of the proper length and special flanges.
- Applications in the field of materials science for tests conducted in conditions of strict temperature control and in a controlled atmosphere.
This kiln is recommended for generic industrial applications, where a good thermal uniformity is required (calibration of conductors and of thermocouples, etc.) or for research in the field of materials (specific applications) or in the electronics and semi-conductor industry (firing, thermal treatments).
It can also be used in the electronics industry for tests on components and semi-conductors in a controlled atmosphere or under vacuum.
Equipment for the automatic introduction of inert gases.
Equipment to work in vacuum.
(All data contained herein are not binding. The manufacturer reserves the right to modify any of them).